The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7268081 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 11, 2007

Filed:

Oct. 02, 2003
Applicant:

Eui-hyeok Yang, Stevenson Ranch, CA (US);

Inventor:

Eui-Hyeok Yang, Stevenson Ranch, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

Techniques for transferring a membrane from one wafer to another wafer to form integrated semiconductor devices. In one implementation, a carrier wafer is fabricated to include a membrane on one side of the carrier wafer. The membrane on the carrier wafer is then bond to a surface of a different, device wafer by a plurality of joints. Next, the carrier wafer is etched away by a dry etching chemical to expose the membrane and to leave said membrane on the device wafer. Transfer of membranes with a wet etching process is also described.


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Yang, Eui-Hyeok. (2007). Wafer-level transfer of membranes with gas-phase etching and wet etching methods (U.S. Patent No. 7268081). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7268081

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