The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2007
Filed:
Aug. 02, 2005
Kazunori Mune, Osaka, JP;
Amane Mochizuki, Osaka, JP;
Yusuke Shimizu, Osaka, JP;
Ryuusuke Naitou, Osaka, JP;
Hideyuki Usui, Osaka, JP;
Kazunori Mune, Osaka, JP;
Amane Mochizuki, Osaka, JP;
Yusuke Shimizu, Osaka, JP;
Ryuusuke Naitou, Osaka, JP;
Hideyuki Usui, Osaka, JP;
Nitto Denko Corporation, Osaka, JP;
Abstract
The present invention provides a process for producing an optical waveguide, comprising the steps of: continuously applying a fluorene derivative layer onto a continuous substrate and curing the layer to thereby form a lower cladding layer; continuously applying a photosensitive fluorene derivative layer onto the lower cladding layer; continuously exposing the applied photosensitive fluorene derivative layer to a light through a photomask having a predetermined pattern; continuously subjecting the exposed photosensitive fluorene derivative layer to post-exposure heating; continuously developing the heated photosensitive fluorene derivative layer to remove the unexposed areas therein, thereby forming into the predetermined pattern; curing the developed photosensitive fluorene derivative layer to thereby form a core layer having the predetermined pattern on the lower cladding layer; and continuously applying a fluorene derivative layer over the lower cladding layer so as to cover the core layer and curing the fluorene derivative layer to thereby form an upper cladding layer.