The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Dec. 23, 2004
Eduardo Alvarez Gallestey, Tägerig, CH;
Alec Stothert, Westborough, MA (US);
Eduardo Alvarez Gallestey, Tägerig, CH;
Alec Stothert, Westborough, MA (US);
ABB Research Ltd, Zurich, CH;
Abstract
The disclosed process control system makes use of Optimal control (OC) and model predictive control (MPC) techniques for selection of the Expert Systems (ES) targets values U. The ES target values U are selected to minimize the performance criterion J. A mathematical model of an extended system given by the process P and the ES is developed. This hybrid mathematical model has both continuous dynamics and logical relationships. Controlled variables of the mathematical model are the ES target values U and inputs are the measurements y and the performance criterion J. The OC and/or MPC techniques are used to compute values U. An optimizer of the OC/MPC selects values of the ES target values U only. This activity has lower sampling rates than selection of controller values, which simplifies the design of the OC/MPC controller.