The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Jul. 14, 2003
Applicant:
William C. Kress, Foothill Ranch, CA (US);
Inventor:
William C. Kress, Foothill Ranch, CA (US);
Assignees:
Kabushiki Kaisha Toshiba, , JP;
Toshiba Tec Kabushiki Kaisha, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 1/405 (2006.01); H04N 1/409 (2006.01);
U.S. Cl.
CPC ...
Abstract
Artifact reduction is achieved by altering the growth of sub-cells for each super-cell in either a pre-determined or random manner. The means of alteration is selected such that the sum of all the groups equals a halftone value. In another embodiment, the random group is selected by using predetermined patterns which are different among sub-cells, such as different means of constructing a dot. Preferably a different pattern is used in adjacent super-cells. In yet another embodiment, the method selects sub-cells patterns that are not aligned on the super-cell boundaries.