The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2007

Filed:

May. 16, 2005
Applicants:

Hirofumi Takatsuka, Hachioji, JP;

Yoshiharu Saito, Hachioji, JP;

Yasushi Aono, Yokohama, JP;

Inventors:

Hirofumi Takatsuka, Hachioji, JP;

Yoshiharu Saito, Hachioji, JP;

Yasushi Aono, Yokohama, JP;

Assignee:

Olympus Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

While carrying out microscope examination, it is possible to specify a position to be irradiated with optical stimulus light and to accurately apply an optical stimulus to the specified irradiation position. A microscope examination method includes a step of introducing into a specimen a substance in which a structural change is caused by irradiation with light of a first wavelength; a step of specifying an optical stimulation site in the specimen by irradiating the specimen with visible light of a second wavelength that does not cause a structural change in the substance, while examining the specimen in which the substance is introduced using a microscope examination apparatus; and a step of irradiating the specified optical stimulus site with the light of the first wavelength.


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