The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Sep. 12, 2006
Myung Won Song, Seoul, KR;
Tae Min Kang, Yongin, KR;
Sam IL Kho, Yongin, KR;
Young Gil Kwon, Yongin, KR;
Mu Hyun Kim, Yongin, KR;
Sun Hoe Kim, Jeongeup, KR;
Sok Won Noh, Seoul, KR;
Yeun Joo Sung, Yongin, KR;
Jin Wook Seong, Seoul, KR;
Nam Choul Yang, Yongin, KR;
Byeong Wook Yoo, Yongin, KR;
Seong Taek Lee, Yongin, KR;
Jae Ho Lee, Yongin, KR;
Myung Won Song, Seoul, KR;
Tae Min Kang, Yongin, KR;
Sam Il Kho, Yongin, KR;
Young Gil Kwon, Yongin, KR;
Mu Hyun Kim, Yongin, KR;
Sun Hoe Kim, Jeongeup, KR;
Sok Won Noh, Seoul, KR;
Yeun Joo Sung, Yongin, KR;
Jin Wook Seong, Seoul, KR;
Nam Choul Yang, Yongin, KR;
Byeong Wook Yoo, Yongin, KR;
Seong Taek Lee, Yongin, KR;
Jae Ho Lee, Yongin, KR;
Samsung SDI Co., Ltd., Suwon-si, KR;
Abstract
A manufacturing method using an additional heat-treatment process for a donor film with improved surface roughness. The improved donor film, used in a laser induced thermal imaging method, is capable of enhancing the lifetime of products and reducing the defect rates thereof. A manufacturing method for a donor film according to the invention, includes: providing a donor film comprising a base film, a light-to-heat conversion layer and an organic film; heating the donor film to provide a heat-treated donor film; and cooling the heat-treated donor film. The surface roughness of a donor film can be improved, and the non-uniform distribution of a laser on a region subjected to the LITI process can be minimized to prevent the over- or under-transfer of an transferred organic film, etc., and the non-uniform adhesion of the transferred organic film with an acceptor substrate.