The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Sep. 30, 2004
Daniel Bedell, Gilroy, CA (US);
Jennifer A. Loo, Gilroy, CA (US);
Aron Pentek, San Jose, CA (US);
Murali Ramasubramanian, Fremont, CA (US);
Daniel Bedell, Gilroy, CA (US);
Jennifer A. Loo, Gilroy, CA (US);
Aron Pentek, San Jose, CA (US);
Murali Ramasubramanian, Fremont, CA (US);
Hitachi Global Storage Technologies, San Jose, CA (US);
Abstract
A method for reducing plated pole height loss in the formation of a write pole for a magnetic write head is disclosed. The method includes forming a conductive layer on a thin film substrate, forming a photoresist layer on the conductive layer and forming a trench in the photoresist layer. A thick seed layer is then placed on the trench and on the photoresist layer surface using a collimator. Moreover, the process includes plating while applying a voltage to the thin film substrate where the electrically isolated seed layer is removed and the trench is filled with plating material, removing the photoresist layer, and removing the exposed portions of the conductive layer on the thin film substrate.