The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2007

Filed:

Jul. 01, 2005
Applicants:

Ramkumar Subramanian, Sunnyvale, CA (US);

Bhanwar Singh, Morgan Hill, CA (US);

Khoi A. Phan, San Jose, CA (US);

Inventors:

Ramkumar Subramanian, Sunnyvale, CA (US);

Bhanwar Singh, Morgan Hill, CA (US);

Khoi A. Phan, San Jose, CA (US);

Assignees:

Spansion LLC, Sunnyvale, CA (US);

Advanced Micro Devices, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion space; charging the immersion space with a supercritical fluid; removing the supercritical fluid from the immersion space; and charging the immersion space with immersion liquid.


Find Patent Forward Citations

Loading…