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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7262243 B1

PDFFull Text
Expired
Date of Patent:
Aug. 28, 2007

Filed:

Jul. 28, 2005

Coating composition, antireflection film, photoresist and pattern formation method using it

Applicants:

Nobuyuki Otozawa, Yokohama-shi, JP;

Toyomichi Shimada, Yokohama-shi, JP;

Takashige Maekawa, Yokohama-shi, JP;

Naoko Sumi, Ichihara-shi, JP;

Inventors:

Nobuyuki Otozawa, Yokohama-shi, JP;

Toyomichi Shimada, Yokohama-shi, JP;

Takashige Maekawa, Yokohama-shi, JP;

Naoko Sumi, Ichihara-shi, JP;

Assignee:

Asahi Glass Company, Limited, Tokyo, JP;

Attorney:

Oblon, Spivak, McClelland, Maier & Neustadt, P.C.

Primary Examiner:

Duane Smith

Assistant Examiner:

Ives Wu

Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/004 (2006.01); H01L 21/027 (2006.01); B05D 5/06 (2006.01); B32B 27/08 (2006.01); B32B 27/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

To provide a coating composition useful to form an antireflection film having a refractive index lower than 1.4, excellent in water solubility and long-term stability in the form of a water solution. A coating composition containing a fluoropolymer having ionic functional groups (such as a fluoropolymer having polymer units of —CFCF[O(CF)COOH]—), an acid and an aqueous medium.

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Otozawa, Nobuyuki. (2007). Coating composition, antireflection film, photoresist and pattern formation method using it (U.S. Patent No. 7262243). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7262243

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