The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2007
Filed:
Mar. 30, 2004
Martin W. Rupich, Framingham, MA (US);
Urs-detlev Schoop, Tucson, AZ (US);
Darren Verebelyi, Oxford, MA (US);
Thomas Kodenkandath, North Grafton, MA (US);
Xiaoping LI, Westborough, MA (US);
Martin W. Rupich, Framingham, MA (US);
Urs-Detlev Schoop, Tucson, AZ (US);
Darren Verebelyi, Oxford, MA (US);
Thomas Kodenkandath, North Grafton, MA (US);
Xiaoping Li, Westborough, MA (US);
American Superconductor Corporation, Westborough, MA (US);
Abstract
A method of making a multilayer article includes depositing a first material on the surface of a metal substrate to form a seed layer of the first material, the first material being deposited under reducing conditions relative to the metal substrate, and then epitaxially depositing a second material on a surface of the seed layer, wherein the second material is deposited from a solution-based precursor under second conditions that are more oxidizing than the reducing conditions used in the deposition of the first material.