The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2007

Filed:

Jun. 11, 2002
Applicant:

Hiroyuki Tadano, Kitakatsuragi-gun, JP;

Inventor:

Hiroyuki Tadano, Kitakatsuragi-gun, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A focus control process (S), a spherical aberration correcting process (S), and a focus offset adjusting process (Sto S) are performed in this order. In the focus control process, an output of a focus error signal obtained by detecting focal point displacement that occurs in a direction of an optical axis of a light beam focused through a two-element object lens is controlled so that the output becomes close to zero. In the spherical aberration correcting process, spherical aberration that occurs with respect to the light beam is corrected. In the focus offset adjusting process, offset of the focus error signal is adjusted. In this way, it is possible to provide a focal point adjusting method and an optical pickup device in which focus control can be performed stably by eliminating the offset.


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