The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2007
Filed:
Jan. 14, 2004
Paul M. Butterfield, Ontario, NY (US);
Joseph D. Hancock, Rochester, NY (US);
Norman L. Roof, Jr., Palmyra, NY (US);
Shawn P. Updegraff, Fairport, NY (US);
Paul M. Butterfield, Ontario, NY (US);
Joseph D. Hancock, Rochester, NY (US);
Norman L. Roof, Jr., Palmyra, NY (US);
Shawn P. Updegraff, Fairport, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
Methods for automated uniformity assessment and modification of image non-uniformities using an image measurement device capable of determining image reflectance and/or transmitter as a function of position, such as a spectrophotometer, a calorimeter, and/or a densitometer. One or more of these devices scan an image on a substrate, such as a sheet, thereby generating data representing image characteristics, such as, for example, image non-uniformity. The sheet may contain a reference/test pattern including one column, strip or patch intended to have a uniform density. This data generated by the device after the scan of the substrate is analyzed with signal processing algorithms for image characteristics assessment, including image spatial uniformity and compared to reference image characteristics including image spatial uniformity. An image modification profile may be generated to be applied to a marking system to thereby alter subsequent image data and improve image spatial uniformity of the marking system.