The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2007

Filed:

Mar. 28, 2005
Applicants:

Shuichi Ishii, Kanagawa-ken, JP;

Hiromi Ishikawa, Kanagawa-ken, JP;

Yoji Okazaki, Kanagawa-ken, JP;

Inventors:

Shuichi Ishii, Kanagawa-ken, JP;

Hiromi Ishikawa, Kanagawa-ken, JP;

Yoji Okazaki, Kanagawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An image exposure device includes an exposure head for forming a desired pattern on a photosensitive material. The exposure head is equipped with a light source for emitting a great number of light beams, a spatial light modulator in which a great number of pixel portions are arranged for independently modulating the light beams emitted from the light source, a micro lens array in which a great number of micro lenses are arranged for individually converging the great number of light beams modulated by the pixel portions, and a total of two or more aperture arrays arranged in the stage before the micro lens array and/or the stage after the micro lens array. Each of the aperture arrays has a great number of apertures for individually restricting the light beams.


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