Hard laminated film, method of manufacturing the same and film-forming device

Abstract

A hard laminated film wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less. Layer A has a cubic rock-salt crystal structure such as that of Ti, Cr, Al, V nitride, carbonitride or carbide, and layer B is a hard film having a crystal structure other than cubic such as that of BN, BCN, SiN, SiC, SiCN, B—C, Cu, CuN, CuCN or metallic Cu. Alternatively, layer A has a chemical composition satisfying the following formula (1), and layer B has a chemical composition satisfying the following formula (2). Layer A: Cr(BCNO)0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, 0.2≦e≦1.1  (1) Layer B: BCN0≦s 0.25, (1-s-t)/t≦1.5  (2) Alternatively, Layer A has a specific atomic ratio composition of (TiAlM)(BCNO) and Layer B has one or more specific atomic ratio compositions selected from among the compositions BCN, SiCN, CN, Cu(CN). Alternatively, Layer A has one of the following Compositional Formulae 1 or 2. Formula 1: (TiAlM), (BCNO), Formula 2: (CrαXα)(BCNO)(X is one or more metal elements selected from among Ti, Zr, Hf, V, Nb, Ta, Mo, W, Al, Si. Layer B has the following compositional formula 3. Formula 3: M(BCNO). M is one or more metal elements selected from among W, Mo, V, Nb.