The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Sep. 29, 2004
Jun Maeda, Mihama-ku, JP;
Jun Maeda, Mihama-ku, JP;
Kawasaki Microelectronics, Inc., Chiba, JP;
Abstract
In an exemplary layout structure of a semiconductor integrated circuit manufactured by a photolithographic process using an exposing light having a wavelength λ, a peripheral circuit region is formed by arranging a plurality of peripheral circuit cells, each having peripheral circuit patterns, along a side of an internal circuit region. A proximity dummy region is formed by arranging a plurality of proximity dummy cells, each having a proximity dummy pattern, along at least one side of the peripheral circuit region. The proximity dummy region includes a line-and-space repetition structure including, and having the regularity of, two or more pairs of lines and spaces between the lines every 8λ. The repetition structure in the proximity dummy region reduces the dimensional deviation in the outermost portion of the peripheral circuit region.