The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Apr. 02, 2003
Masafumi Sakaguchi, Suwa, JP;
Masafumi Sakaguchi, Suwa, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
To eliminate ghosts caused by retroreflection of projected light and obtain high resolution images. Fine irregularitiesare randomly formed on the plane of incidenceof a Fresnel lens sheetwith little space between them. The glossiness (Gs 60°) of the fine irregularitiesformed by such a random pattern is equal or less than 35%. The fine irregularitiesare in a semispherical shape, the level difference is about 10 μm, and the maximum diameter is about 50 μm. Projected light L is scattered by the fine irregularities 5 at the plane of incidence, subjected to vector resolution, and has its optical intensity weakened, so that retroreflection light can be prevented.