The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
May. 30, 2003
Junichi Fujimori, Shizuoka-ken, JP;
Junichi Fujimori, Shizuoka-ken, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
The present invention provides an image forming method comprising the steps (1) to (5): (1) forming a first negative photosensitive resin layer on a substrate; (2) forming a barrier layer on the first negative photosensitive resin layer; (3) forming a second negative photosensitive resin layer on the barrier layer; (4) exposing the substrate, on which the first and second negative photosensitive resin layers are formed, to light via a photo mask having at least two types of light transmissible patterns; and (5) developing the exposed first and second negative photosensitive resin layers, wherein a photosensitivity ratio of the first negative photosensitive resin layer to the second negative photosensitive resin layer (the first/the second) is more than 1. The invention also provides a color filter, a spacer for a liquid crystal display device, and a projection for orientation control, each of which is formed by the method.