The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Jun. 25, 2004
Sanjay Rekhi, Fremont, CA (US);
Michael LA Bouff, Los Gatos, CA (US);
Sanjay Rekhi, Fremont, CA (US);
Michael La Bouff, Los Gatos, CA (US);
Cypress Semiconductor Corporation, San Jose, CA (US);
Abstract
In one embodiment, a level in a process technology for an integrated circuit that has dummy metal patterns is represented as a level in a process model. The level of the process model may comprise a high-k dielectric to represent the dummy metal patterns. In the level of the process model, each metal line may be surrounded by a normal dielectric. If the process technology has voids or pockets of air in between the metal lines, then each void or air pocket may be placed in a normal dielectric in the process model. Among other advantages, this allows the process model to take into account the effects of the dummy metal patterns.