The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2007

Filed:

Jul. 03, 2003
Applicants:

Jiang Hsieh, Brookfield, WI (US);

Brian Grekowicz, Waukesha, WI (US);

Edward Henry Chao, Oconomowoc, WI (US);

Scott Matt Mcolash, Wauwatosa, WI (US);

Amy Lynn Horst, Hartford, WI (US);

Inventors:

Jiang Hsieh, Brookfield, WI (US);

Brian Grekowicz, Waukesha, WI (US);

Edward Henry Chao, Oconomowoc, WI (US);

Scott Matt McOlash, Wauwatosa, WI (US);

Amy Lynn Horst, Hartford, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method includes calculating a sum of all samples at each projection view of a scan of an object, determining a maximum value of the calculated sums, averaging a plurality of samples m at a projection view index k when the sum of all samples at index k is less than a predetermined percentage of the maximum value, comparing the average to a threshold t, determining the projection truncated when the average is greater than t, and determining the projection not truncated when the average is not greater than t.


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