The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Feb. 17, 2004
Kurt A. Carlsen, Burlington, VT (US);
Kurt A. Carlsen, Burlington, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system and method for abating a simultaneous flow of silane and arsine contained in an exhaust gas of DRAM processing chamber (). The system includes a CVD abatement apparatus () and a resin-type absorber (). The CVD abatement apparatus comprises an enclosure () that defines a chamber () for receiving the exhaust gas. The enclosure contains a plurality of removable substrates () arranged as a series of baffles inside the enclosure. As the exhaust gas flows through the CVD abatement apparatus, the silicon within the silane is deposited as a film upon the substrates by chemical vapor deposition. The arsine continues to flow through the CVD apparatus to the absorber where it is adsorbed by the resin contained therein. After the film has reached a particular thickness, the substrates can be removed from the enclosure, cleaned of the film and returned to the enclosure for further use.