The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Jan. 20, 2006
Chuan-de Huang, Tu-Cheng, TW;
Chuan-De Huang, Tu-Cheng, TW;
Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;
Abstract
A topography analyzing system () for analyzing a topographic microstructure is provided. The topography analyzing system includes a three-dimensionally adjustable platform (), a loading platform (), a microscopic viewing device (), a topography measuring device (), and a mirror (). The adjustable platform is adapted for adjusting the spatial positions of itself and what is loaded thereon. The loading platform is disposed on the adjustable platform and is adapted for having a workpiece () to be evaluated loaded thereon. The topography measuring device is aside/adjacent the adjustable platform. The topography measuring device includes a probe extending to and overhanging the workpiece for detecting topography of the workpiece. The mirror is secured at an adjustable angle relative to the three-dimensional adjustable platform and is adapted for forming a mirror image of the probe and a selected measuring area of the workpiece.