The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Jun. 30, 2004
Quang Le, San Jose, CA (US);
Jui-lung LI, San Jose, CA (US);
Yvette Chung Nga Winton, San Francisco, CA (US);
Sue Siyang Zhang, Saratoga, CA (US);
Yi Zheng, San Ramon, CA (US);
Quang Le, San Jose, CA (US);
Jui-Lung Li, San Jose, CA (US);
Yvette Chung Nga Winton, San Francisco, CA (US);
Sue Siyang Zhang, Saratoga, CA (US);
Yi Zheng, San Ramon, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method and apparatus for defining leading edge taper of a write pole tip is disclosed. The fabrication process uses reactive ion etching to fabricate LET with tight control of the placement of LET's edge and to achieve higher angle for providing a higher effective write field at the pole tip while minimizing ATI for high-density perpendicular recording. The placement of a resist's edge is used to define the LET's edge and a CMP process is used to provide a planar surface for the fabrication of the write pole.