The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Jun. 02, 2005
Applicants:
John W. Lewellen, Plainfield, IL (US);
John Noonan, Naperville, IL (US);
Inventors:
John W. Lewellen, Plainfield, IL (US);
John Noonan, Naperville, IL (US);
Assignee:
UChicago Argonne LLC, Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.