The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Feb. 22, 2006
James C. Stevens, Richmond, TX (US);
Daniel D. Vanderlende, Sugarland, TX (US);
Patricia Ansems, West Columbia, TX (US);
James C. Stevens, Richmond, TX (US);
Daniel D. Vanderlende, Sugarland, TX (US);
Patricia Ansems, West Columbia, TX (US);
Dow Global Technologies Inc., Midland, MI (US);
Abstract
Polymer blends that exhibit good impact resistance comprise a crystalline polypropylene matrix and a partly crystalline copolymer impact modifier with a molecular weight lower than that of the matrix polymer. The matrix polymer can comprise any crystalline propylene homo- or copolymer. The impact modifying copolymers are characterized as comprising at least about 60 weight percent (wt %) of units derived from propylene and, in certain embodiments, as having at least one, preferably two or more, of the following properties: (i)C NMR peaks corresponding to a regio-error at about 14.6 and about 15.7 ppm, the peaks of about equal intensity, (ii) a B-value greater than about 1.4 when the comonomer content of the copolymer is at least about 3 wt %, (iii) a skewness index, S, greater than about −1.20, (iv) a DSC curve with a Tthat remains essentially the same and a Tthat decreases as the amount of comonomer in the copolymer is increased, and (v) an X-ray diffraction pattern that reports more gamma-form crystals than a comparable copolymer prepared with a Ziegler-Natta (Z-N) catalyst.