The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Aug. 08, 2003
Cyprian E. Uzoh, San Jose, CA (US);
Homayoun Talieh, San Jose, CA (US);
Bulent M. Basol, Manhattan Beach, CA (US);
Halit N. Yakupoglu, Corona, CA (US);
Cyprian E. Uzoh, San Jose, CA (US);
Homayoun Talieh, San Jose, CA (US);
Bulent M. Basol, Manhattan Beach, CA (US);
Halit N. Yakupoglu, Corona, CA (US);
Novellus Systems, Inc., Phoenix, AZ (US);
Abstract
The methods and systems described provide for radiation assisted material deposition, removal, and planarization at a surface, edge, and/or bevel of a workpiece such as a semiconductor wafer. Exemplary processes performed on a workpiece surface having topographical features include radiation assisted electrochemical material deposition, which produces an adsorbate layer outside of the features to suppress deposition outside of the features and to encourage, through charge conservation, deposition into the features to achieve, for example, a planar surface profile. A further exemplary process is radiation assisted electrochemical removal of material, which produces an adsorbate layer in the features to suppress removal of material from the features and to encourage, through charge conservation, removal of material outside of the features so that, for example, a planar surface profile is achieved.