The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Jun. 06, 2005
Ing-shouh Hwang, Taipei, TW;
Shao-kang Hung, Taipei, TW;
Li-chen Fu, Taipei, TW;
Ming-yen Lin, Taipei, TW;
Ing-Shouh Hwang, Taipei, TW;
Shao-Kang Hung, Taipei, TW;
Li-Chen Fu, Taipei, TW;
Ming-Yen Lin, Taipei, TW;
Academia Sinica, , TW;
Abstract
Disclosed is a novel scanning-probe type atomic force microscope wherein false deflection of the probe is reduced. The probe of the scanning-probe type atomic force microscope moves in both the horizontal direction and the vertical direction during the scanning, while the sample is kept in order to reduce the false deflection brought to the probe due to the scanning motion, two approaches are adopted. The first is to have a focused laser spot tracking an invariant point on the probe's cantilever, which moves three-dimensionally during the scanning. The second approach is to have the laser beam, which is reflected from the moving cantilever, hitting an invariant point of the PSD, when the sample is distanced from the probe and induces no deflection. A beam tracking system wherein the scanning probe is located approximately at the focal point of an objective lens and he optical system including a laser source, an optical module, a feedback module and the probe are driven by an approach mechanism to move in synchronization.