The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2007
Filed:
Jul. 20, 2001
Applicants:
Mathias Destarac, Paris, FR;
Frédéric Leising, Avilly St-Leonard, FR;
Yves Gnanou, Talence, FR;
Daniel Taton, Camarsac, FR;
Alex Dureault, Paris, FR;
Inventors:
Mathias Destarac, Paris, FR;
Frédéric Leising, Avilly St-Leonard, FR;
Yves Gnanou, Talence, FR;
Daniel Taton, Camarsac, FR;
Alex Dureault, Paris, FR;
Assignee:
Rhodia Chimie, Aubervilliers, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/38 (2006.01); C08F 293/00 (2006.01); C08F 230/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention concerns a method for preparing a first generation polymer comprising a step which consists in free radical polymerization of a composition comprising: at least an ethylenically unsaturated monomer, a source of free radicals, at least a dithiophosphoroester compound.