The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2007

Filed:

Dec. 01, 2005
Applicants:

Shashikant Saraiya, Fort Collins, CO (US);

Jayanti Patel, Fort Collins, CO (US);

Ting Tao, Fort Collins, CO (US);

Kevin B Ray, Fort Collins, CO (US);

Frederic E. Mikell, Greeley, CO (US);

James L. Mulligan, Fort Collins, CO (US);

John Kalamen, Loveland, CO (US);

Scott A. Beckley, Windsor, CO (US);

Eric Clark, Loveland, CO (US);

Inventors:

Shashikant Saraiya, Fort Collins, CO (US);

Jayanti Patel, Fort Collins, CO (US);

Ting Tao, Fort Collins, CO (US);

Kevin B Ray, Fort Collins, CO (US);

Frederic E. Mikell, Greeley, CO (US);

James L. Mulligan, Fort Collins, CO (US);

John Kalamen, Loveland, CO (US);

Scott A. Beckley, Windsor, CO (US);

Eric Clark, Loveland, CO (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both. When this polymer comprises pendant adamantyl groups, they are connected to the polymer backbone through a urea or urethane group. The imageable elements have improved chemical resistance and thermal bakeability from the presence of the unique solvent-resistant polymer.


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