Memory device having open bit line cell structure using burn-in testing scheme and method therefor

Abstract

A memory device having an open bit line cell structure uses a wafer burn-in testing scheme and a method for testing the same. The memory device includes a sense amplifier having first and second input terminals; a bit line connected to the first input terminal of the sense amplifier and extended in a first direction; an inverted bit line connected to the second input terminal of the sense amplifier and extended in a second direction; and a voltage supply means for applying the same voltage to the bit line and the inverted bit line in a precharge operation mode and applying a different level voltage to the bit line and the inverted bit line in a burn-in test operation mode. It is possible to efficiently screen defects of memory cells and between bit lines by performing a wafer burn-in test using a wafer burn-in scheme on a memory device having an open bit line cell structure.