The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2007
Filed:
Jul. 26, 2003
Harmin Müller, Hofheim, DE;
Martin Jakob, Kelkheim, DE;
Carsten Heldmann, Schöneck, DE;
Thomas Wirth, Stadecken-Elsheim, DE;
Harmin Müller, Hofheim, DE;
Martin Jakob, Kelkheim, DE;
Carsten Heldmann, Schöneck, DE;
Thomas Wirth, Stadecken-Elsheim, DE;
Celanese Emulsions GmbH, Kronberg/Ts., DE;
Abstract
The invention relates to a method for reducing the amount of residual monomers in aqueous polymer dispersions means of chemical post-treatment. Post-treatment in the aqueous polymer dispersion is carried out by adding a redox system which contains a) 0.005-5 wt. % of an oxidation agent which contains an organic peroxide. and b) 0.005-5 wt. % of a reduction agent which contains sulfinic acids or salts thereof. Additionally the redox system can, optionally, contain catalytic amounts of a polyvalent metallic ion which can be treated in several valent stages. Post-treatment can be carried out at a temperature ranging from 20-100.degree. C. and at a PH-value ranging from 2-9. The invention also relates to the use of the inventive post-treated polymer dispersion for producing adhesives, coatings, powders, constructive chemical products or for refining textiles or paper.