The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2007
Filed:
Jul. 05, 1997
Hans Wilfried Peter Koops, Ober-Ramstadt, DE;
Hans Wilfried Peter Koops, Ober-Ramstadt, DE;
Deutsche Telekom AG, Bonn, DE;
Abstract
'A process for fabricating active and passive, polymer-based components for use in integrated optics. As a result of this process, active and passive optoelectronic components of a high quality having a high level of integration and high packing density are fabricated. A patternable polymer resist layer of a high quality is deposited onto an optoelectronic component. An etching mask is used in conjunction with a high-grade anisotropic deep etching to produce a pattern, which is filled with monomers through gas-phase or liquid-phase diffusion. The optical properties of the optical component can be selectively changed as a function of the type of monomers used for the diffusion, as well as of the temperature and application time. The process makes it possible to increase the packing density of future integrated monomode optics and simultaneously produce large quantities in a cost-effective manner.'