The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2007

Filed:

May. 06, 2004
Applicant:

Joachim Wienecke, Jena, DE;

Inventor:

Joachim Wienecke, Jena, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G02B 27/40 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In the manufacture of integrated circuits on a wafer, it is necessary to monitor the manufacturing process by inspecting the ICs as to whether errors or defects have occurred during production. It is already known to use a scattered-light device () to determine whether a defect is present on the wafer. According to the present invention, defect examination is now improved in that defect-suspected regions () are identified using the scattered-light device (). With a further examination system () different from the scattered-light device (), a determination is then made as to whether the defect-suspected regions () are defects. The latter can then also be classified.


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