The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Apr. 19, 2005
Ken-ichiro Shinoda, Utsunomiya, JP;
Ken-ichiro Shinoda, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Disclosed is an exposure apparatus and method, and a device manufacturing method using the same. An exposure apparatus according to one preferred form of the invention includes an illumination optical system for illuminating an original with light from a light source, and a projection optical system for projecting a pattern of the original onto a substrate, wherein the illumination optical system includes an optical integrator for forming a secondary light source by use of light from the light source and a condenser optical system for directing light from the optical integrator to the original, and wherein the projection optical system includes an optical element such as a lens, made of a glass material of quartz and being disposed adjacent a pupil plane of the projection optical system.