The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Jan. 19, 2005
Sergei F. Lyuksyutov, Akron, OH (US);
Shane Juhl, Dayton, OH (US);
Richard A. Vaia, Beavercreek, OH (US);
Pavlo B. Paramonov, Akron, OH (US);
Sergei F. Lyuksyutov, Akron, OH (US);
Shane Juhl, Dayton, OH (US);
Richard A. Vaia, Beavercreek, OH (US);
Pavlo B. Paramonov, Akron, OH (US);
United States of America as represented by the Secretary of the Air Force, Washington, DC (US);
Abstract
A method of amplitude modulated electrostatic polymer nanolithography providing rapid creation of features in a polymer film is disclosed. The nanolithography method of the present invention generates features by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters (10-10nm) of polymer by Joule heating enabling high data densities upon the surface of the polymer. This localized Joule heating is accomplished by current flow between the cantilever AFM tip and a conductive wafer upon which the layer of polymer is grown or mounted.