The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Apr. 29, 2005
Paul F. Baude, Maplewood, MN (US);
Patrick R. Fleming, Lake Elmo, MN (US);
Michael A. Haase, St. Paul, MN (US);
Tommie W. Kelley, Coon Rapids, MN (US);
Dawn V. Muyres, St. Paul, MN (US);
Steven Theiss, Woodbury, MN (US);
Paul F. Baude, Maplewood, MN (US);
Patrick R. Fleming, Lake Elmo, MN (US);
Michael A. Haase, St. Paul, MN (US);
Tommie W. Kelley, Coon Rapids, MN (US);
Dawn V. Muyres, St. Paul, MN (US);
Steven Theiss, Woodbury, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
Aperture masks and deposition techniques for using aperture masks are described. In addition, techniques for creating aperture masks and other techniques for using the aperture masks are described. The various techniques can be particularly useful in creating circuit elements for electronic displays and low-cost integrated circuits such as radio frequency identification (RFID) circuits. In addition, the techniques can be advantageous in the fabrication of integrated circuits incorporating organic semiconductors, which typically are not compatible with wet processes.