The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Sep. 30, 2004
Applicant:
Gouri Radhakrishnan, Rancho Palos Verdes, CA (US);
Inventor:
Gouri Radhakrishnan, Rancho Palos Verdes, CA (US);
Assignee:
The Aerospace Corporation, El Segundo, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 16/32 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
Reactive halogen-ion plasmas, having for example, generating chloride ions, generated from low-pressure halogen gases using a radio-frequency plasma are employed for producing low-friction carbon coatings, such as a pure carbon film, at or near room temperature on a bulk or thin film of a compound, such as titanium carbide.
Radhakrishnan, Gouri. (2007). Method for producing carbon surface films by plasma exposure of a carbide compound (U.S. Patent No. 7241475). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7241475
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile