The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2007
Filed:
Dec. 03, 2002
Evan E. Koslow, Weston, CT (US);
Evan E. Koslow, Weston, CT (US);
KX Industries L.P., Orange, CT (US);
Abstract
The present invention is directed to a filtration system including filter media that use diffusion as a method of particulate reduction that balances the contact time required for a desirable level of interception and filter performance. The filter system of the present invention includes a filter medium that removes particulate contaminants by diffusion, means for providing sufficient contact time for an influent to contact the filter medium such that the filter medium can intercept sub-micron particulates at an average flow rate below that of an on-demand or instantaneous flow rate; and a storage buffer for providing a filtered effluent at a rate independent of the average flow rate required to achieve adequate particulate reduction through the filter medium.