The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
May. 13, 2003
Magnus Berglund, Axeltorp, SE;
Björn Hansson, Stockholm, SE;
Oscar Hemberg, Stockholm, SE;
Hans Hertz, Stocksund, SE;
Lars Rymell, Stockholm, SE;
Magnus Berglund, Axeltorp, SE;
Björn Hansson, Stockholm, SE;
Oscar Hemberg, Stockholm, SE;
Hans Hertz, Stocksund, SE;
Lars Rymell, Stockholm, SE;
Jettec AB, Stocksund, SE;
Abstract
A method of producing a radiating plasma with an increased flux stability and uniformity is disclosed. The method comprises the steps of generating a primary target by urging a liquid under pressure through a nozzle; directing an energy pre-pulse onto the primary target to generate a secondary target in the form of a gas or plasma cloud; allowing the thus formed secondary target to expand for a predetermined period of time; and directing a main energy pulse onto the secondary target when the predetermined period of time has elapsed in order to produce a plasma radiating X-ray or EUV radiation. The pre-pulse has a beam waist size that is larger, in at least one dimension, than the corresponding dimension of the primary target.