The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Dec. 21, 2005
Kenta Kato, Aichi-ken, JP;
Takaaki Furuyama, Kasugai, JP;
Kenta Kato, Aichi-ken, JP;
Takaaki Furuyama, Kasugai, JP;
Spansion LLC, Sunnyvale, CA (US);
Abstract
In Step, a bias is applied (ON) to all of vertical rows Z() to Z(). With respect to the horizontal rows, a bias is not applied (OFF) to a horizontal row Z() where the defective sector exists and a bias is applied (ON) to the other horizontal rows Z() and Z(). On the sectors in the horizontal rows Z() and Z(), a voltage stress is applied and an access operation is performed. In Step, with respect to the vertical rows, a bias is not applied (OFF) to a vertical row Z() where the defective sector exists and a bias is applied (ON) to the other vertical rows Z() and Z(). With respect to the horizontal rows, a bias is applied (ON) to the horizontal row Z() where the defective sector exists, and no bias is applied (OFF) to the other horizontal rows Z() and Z(). As for the two steps, a voltage stress can be applied once to the sectors other than the defective sector.