The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Jan. 31, 2004
Kyusik Sin, Pleasanton, CA (US);
Yinshi Liu, Foster City, CA (US);
Benjamin Chen, San Jose, CA (US);
Francis H. Liu, Fremont, CA (US);
Kyusik Sin, Pleasanton, CA (US);
Yinshi Liu, Foster City, CA (US);
Benjamin Chen, San Jose, CA (US);
Francis H. Liu, Fremont, CA (US);
Western Digital (Fremont), Inc., Fremont, CA (US);
Abstract
A write element for perpendicular recording in a data storage system is fabricated to maintain the thickness of a side shield at both edges of a pole P, and to form the pole Pin a trapezoidal shape. Forming a side shield around the pole Premoves stray fields, creating a quiet, noise-free write element and preventing side erasure. The fabrication method utilizes a magnetic buffer layer to protect a shield gap during trim of the pole P, and thus to provide the shield gap with a uniform thickness. The magnetic buffer layer also protects the shield gap and pole Pwhen the top hard mask is removed. Consequently, the write field is made uniform across the track width. The fabrication method uses a metal in the shield gap to improve the pole geometry after pole trim and to provide a uniform edge to the pole P