The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2007

Filed:

Aug. 18, 2004
Applicants:

Tomoko Inoue, Kanagawa, JP;

Ken Inoue, Kanagawa, JP;

Inventors:

Tomoko Inoue, Kanagawa, JP;

Ken Inoue, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
Abstract

The short circuit between the bit line and thee cell contact can be prevented without considerably increasing the number of the manufacturing processes. The bit lineelectrically coupled to the cell contactis formed of the material, which is same as the material of cell contact. In the process for forming the bit lineon the cell contact interlayer filmby etching, the etching for creating an upper surface of the cell contactthat is not coupled to the bit linebeing lower than an upper surface of the cell contactthat is coupled to the bit line. Further, after the formation of the bit line, the barrier metal layerformed on the lower surface of the bit lineis selectively etched.


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