The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Jul. 05, 2005
Min-jin Ko, Taejeon, KR;
Bum-gyu Choi, Taejeon, KR;
Dong-seok Shin, Seoul, KR;
Myung-sun Moon, Taejeon, KR;
Jung-won Kang, Seoul, KR;
Hae-young Nam, Cheongju, KR;
Young-duk Kim, Taejeon, KR;
Gwi-gwon Kang, Seoul, KR;
Min-Jin Ko, Taejeon, KR;
Bum-Gyu Choi, Taejeon, KR;
Dong-Seok Shin, Seoul, KR;
Myung-Sun Moon, Taejeon, KR;
Jung-Won Kang, Seoul, KR;
Hae-Young Nam, Cheongju, KR;
Young-Duk Kim, Taejeon, KR;
Gwi-Gwon Kang, Seoul, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
Provided is a process for manufacturing an insulating film for a semiconductor device. The process includes preparing a composition for forming an insulating film, wherein the composition comprises a) an organosilicate polymer and b) an organic solvent. The composition is coated on a substrate of a semiconductor device to prepare a coated insulating film, and the coated insulated film is dried and cured. Also provided are an insulating film prepared as described as well as a semiconductor device comprising the insulating film.