The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2007
Filed:
Dec. 02, 1999
Applicants:
Tatsuya Sakamoto, Kyoto, JP;
Muneyuki Matsumoto, Kyoto, JP;
Inventors:
Tatsuya Sakamoto, Kyoto, JP;
Muneyuki Matsumoto, Kyoto, JP;
Assignee:
Rohm Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 29/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chemical mechanical polishing cloth for chemically mechanically polishing a workpiece. This chemical mechanical polishing cloth includes, on the opposite-to-workpiece face thereof: polishing projections having polishing faces arranged to come in contact with a workpiece for polishing the same; polishing agent passages for introducing a polishing agent; and at least one-stage step portions formed between the polishing faces of the polishing projections and the bottoms of the polishing agent passages.