The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2007

Filed:

Oct. 13, 2004
Applicants:

Robert D. Tolles, Santa Clara, CA (US);

Norm Shendon, San Carlos, CA (US);

Sasson Somekh, Los Altos Hills, CA (US);

Ilya Perlov, Santa Clara, CA (US);

Eugene Gantvarg, Santa Clara, CA (US);

Harry Q. Lee, Mountain View, CA (US);

Inventors:

Robert D. Tolles, Santa Clara, CA (US);

Norm Shendon, San Carlos, CA (US);

Sasson Somekh, Los Altos Hills, CA (US);

Ilya Perlov, Santa Clara, CA (US);

Eugene Gantvarg, Santa Clara, CA (US);

Harry Q. Lee, Mountain View, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods and apparatus for chemical mechanical polishing are described. In one embodiment, an apparatus includes a table top and a transfer station and multiple polishing stations are mounted on the table top. The apparatus further includes multiple washing stations, where each washing station is located between either two polishing stations or between a polishing station and a transfer station. Multiple carrier heads are supported by a support member that is rotatable about an axis. The transfer station and the multiple polishing stations are arranged at approximately equal angular intervals about the axis.


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