The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2007

Filed:

Nov. 29, 2005
Applicants:

R. Bruce Yacko, Toledo, OH (US);

Edward L. Mueller, Toledo, OH (US);

John A. Wiegand, Sylvania, OH (US);

Jeffrey C. Gayer, Sylvania, OH (US);

Todd G. Schimmoeller, Ottawa, OH (US);

Inventors:

R. Bruce Yacko, Toledo, OH (US);

Edward L. Mueller, Toledo, OH (US);

John A. Wiegand, Sylvania, OH (US);

Jeffrey C. Gayer, Sylvania, OH (US);

Todd G. Schimmoeller, Ottawa, OH (US);

Assignee:

JAWS International Ltd., Toledo, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B67D 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for controlling a plurality of chemical substance applicators in a facility includes establishing a supply of chemical substance applicators, the applicators being configured to contain the chemical substance and to enable the chemical substance to be applied at various locations within the facility, the chemical substance applicators having data indicators identifying data about the chemical substance applicators. One or more reading mechanisms are positioned at one or more locations within the facility, the reading mechanism being capable of reading data from the data indicators on the chemical substance applicators. A plurality of the chemical substance applicators is introduced into the facility, the chemical substance applicators having the data indicators. The movement of chemical substance applicators within the facility is controlled by monitoring data from the chemical substance applicators using the reading mechanism.


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