The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2007

Filed:

Feb. 22, 2005
Applicants:

Greg Monty, Vernon Hills, IL (US);

Kwok NG, San Jose, CA (US);

Mohshi Yang, Austin, TX (US);

Richard Finh, Austin, TX (US);

Inventors:

Greg Monty, Vernon Hills, IL (US);

Kwok Ng, San Jose, CA (US);

Mohshi Yang, Austin, TX (US);

Richard Finh, Austin, TX (US);

Assignee:

Nano-Proprietary, Inc., Austin, TX (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides for novel hydrogen sensors and methods for making same. In some embodiments, such novel hydrogen sensors are continuous-range hydrogen sensors comprising Pd—Ag nanoparticles arrayed as nanowires or two-dimensional shapes on a resistive surface. Such continuous-range hydrogen sensors are capable of measuring a wide range of hydrogen gas concentration over a wide temperature range. Unlike existing hydrogen sensors that experience a large change in resistance at a certain hydrogen concentration, the continuous-range hydrogen sensor of the present invention changes resistance continuously over a broad range of hydrogen concentration. This continuous change varies slowly with hydrogen concentration and is predictable such that the continuous-range hydrogen sensor can be used to measure hydrogen concentration continuously from a few ppm to 40,000 ppm level or higher over a broad range of temperatures (e.g., −40° C. to +150° C.).


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