The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2007

Filed:

Feb. 03, 2006
Applicants:

David M. Gibson, Voorheesville, NY (US);

Walter M. Gibson, Voorheesville, NY (US);

Huapeng Huang, Latham, NY (US);

Inventors:

David M. Gibson, Voorheesville, NY (US);

Walter M. Gibson, Voorheesville, NY (US);

Huapeng Huang, Latham, NY (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.


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