The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Jan. 10, 2001
Jennifer LU, San Jose, CA (US);
Dennis Richard Mckean, San Jose, CA (US);
Cherngye Hwang, San Jose, CA (US);
Shi Ning, San Jose, CA (US);
Jennifer Lu, San Jose, CA (US);
Dennis Richard McKean, San Jose, CA (US);
Cherngye Hwang, San Jose, CA (US);
Shi Ning, San Jose, CA (US);
Hitachi Global Storage Netherlands, B.V., Amsterdam, NL;
Abstract
The present invention relates to a method for producing a transducer slider. The method involves first coating a substrate with a radiation-sensitive layer and exposing the radiation-sensitive layer to radiation according to an intensity pattern. Preferably, the intensity pattern is provided using a grayscale mask. Once the image is developed into the radiation-sensitive layer, the image is transferred into the substrate to form a transducer slider having a surface profile comprising a tapered edge. In the alternative or in addition, the surface profile may comprise a rounded corner. The invention also relates to a structure for forming a transducer slider.