The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Oct. 18, 2005
Thomas Robert Albrecht, San Jose, CA (US);
Zvonimir Z. Bandic, San Jose, CA (US);
Thomas Robert Albrecht, San Jose, CA (US);
Zvonimir Z. Bandic, San Jose, CA (US);
Hitachi Global Storage Technologies, Amsterdam, NL;
Abstract
An apparatus, system, and method are disclosed for utilizing a 'shadow mask' approach to fabricate servo patterns on high density patterned media. The apparatus may include a deposition mask having a plurality of apertures generated by a conventional lithographic process. Material may be deposited onto a substrate through the deposition mask apertures from at least one deposition source oriented at unique deposition angles. In this manner, each aperture may correspond to multiple deposition locations. Apertures may be precisely dimensioned and positioned to create servo pattern features from the resulting deposition locations. The deposition mask may also include a plurality of bit pattern apertures adapted to direct a material to a plurality of deposition locations on the substrate, the deposition locations forming a bit pattern concurrent with formation of a servo pattern.