The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Jan. 29, 2004
Sadayuki Kobayashi, Nagoya, JP;
Jiro Kumaki, Nagoya, JP;
Akira Hirai, Tokyo, JP;
Toru Nishimura, Nagoya, JP;
Sadayuki Kobayashi, Nagoya, JP;
Jiro Kumaki, Nagoya, JP;
Akira Hirai, Tokyo, JP;
Toru Nishimura, Nagoya, JP;
Toray Industries, Inc., Tokyo, JP;
Abstract
This invention is a method for manufacturing a polymer alloy, by making at least two resins used as components miscible, and inducing the spinodal decomposition for causing phase separation, for forming a co-continuous structure with a wavelength of concentration fluctuation of 0.001 to 1 μm or a dispersed structure with a distance between particles of 0.001 to 1 μm. This invention is also a polymer alloy manufactured by the method. The polymer alloy of this invention can provide a molded article, film, fibers and the like respectively with excellent mechanical properties at high productivity.